Accession Number : ADD015930

Title :   Volatile CVD Precursors Based on Copper Alkoxides and Mixed Group IIA-Copper Alkoxides.

Descriptive Note : Patent, Filed 31 Jan 92, patented 25 May 93,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Purdy, Andrew

Report Date : 25 May 1993

Pagination or Media Count : 3

Abstract : Fluorinated alkoxy compounds of copper, copper-calcium, copper-strontium, and copper-barium having a certain structure in which 1 less than or equal w less than or equal 4; R is a fluorinated alkyl group; x greater than or equal 1; Y is an alkoxy or alkyl group without beta-hydrogen; Y greater than or equal 0; w less than or equal (x+y) less than or equal 2w; L is a Lewis base; 1 less than or equal z less than or equal 2w; M is Ca, Sr, or Ba; and 1 less than or equal a less than or equal 4; 1 less than or equal b less than or equal 4; (b + 2a) less than or equal c less than or equal 2(b+a), have exceptionally high volatilities, and hence low vaporization or sublimation temperatures, at 10 (exp-5) torr. They are superior precursor compounds for chemical vapor deposition of thin films on substrates under vacuum, and for sol-gel processing.

Descriptors :   *COPPER, *PRECURSORS, *THIN FILMS, *PATENTS, *CHEMICAL VAPOR DEPOSITION, *VOLATILITY, BARIUM, CALCIUM, HYDROGEN, PROCESSING, STRONTIUM, SUBLIMATION, SUBSTRATES, TEMPERATURE, VACUUM, VAPORIZATION, ALCOHOLS, ALKALI METALS, FLUORINATED HYDROCARBONS, ALKOXY RADICALS, ALKYL RADICALS

Subject Categories : Organic Chemistry
      Physical Chemistry
      Laminates and Composite Materials
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE