Accession Number : ADD015930
Title : Volatile CVD Precursors Based on Copper Alkoxides and Mixed Group IIA-Copper Alkoxides.
Descriptive Note : Patent, Filed 31 Jan 92, patented 25 May 93,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Purdy, Andrew
Report Date : 25 May 1993
Pagination or Media Count : 3
Abstract : Fluorinated alkoxy compounds of copper, copper-calcium, copper-strontium, and copper-barium having a certain structure in which 1 less than or equal w less than or equal 4; R is a fluorinated alkyl group; x greater than or equal 1; Y is an alkoxy or alkyl group without beta-hydrogen; Y greater than or equal 0; w less than or equal (x+y) less than or equal 2w; L is a Lewis base; 1 less than or equal z less than or equal 2w; M is Ca, Sr, or Ba; and 1 less than or equal a less than or equal 4; 1 less than or equal b less than or equal 4; (b + 2a) less than or equal c less than or equal 2(b+a), have exceptionally high volatilities, and hence low vaporization or sublimation temperatures, at 10 (exp-5) torr. They are superior precursor compounds for chemical vapor deposition of thin films on substrates under vacuum, and for sol-gel processing.
Descriptors : *COPPER, *PRECURSORS, *THIN FILMS, *PATENTS, *CHEMICAL VAPOR DEPOSITION, *VOLATILITY, BARIUM, CALCIUM, HYDROGEN, PROCESSING, STRONTIUM, SUBLIMATION, SUBSTRATES, TEMPERATURE, VACUUM, VAPORIZATION, ALCOHOLS, ALKALI METALS, FLUORINATED HYDROCARBONS, ALKOXY RADICALS, ALKYL RADICALS
Subject Categories : Organic Chemistry
Laminates and Composite Materials
Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE