Accession Number : ADD016065

Title :   Method of Producing a Silicon Membrane Using a Silicon Alloy Etch Stop Layer.

Descriptive Note : Patent Application, Filed 30 Jun 93,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Godbey, David J

Report Date : 30 Jun 1993

Pagination or Media Count : 19

Abstract : A method of producing a silicon membrane has a step of forming an etch stop layer on an upper surface of a silicon substrate having lower and upper opposing surfaces, the etch stop layer comprising an alloy of silicon and at least one other Group IV element. The method of producing a silicon membrane has another step of forming a cap layer on the etch stop layer, the cap layer having lower and upper opposing surfaces with the lower surface contacting the etch stop layer.(Author)

Descriptors :   *PATENT APPLICATIONS, *SILICON ALLOYS, *MEMBRANES, *ETCHING, LAYERS, SURFACES, SUBSTRATES, GROUP IV COMPOUNDS, X RAYS, LITHOGRAPHY, COATINGS, GOLD, MASKS, COMPOSITE MATERIALS

Subject Categories : Properties of Metals and Alloys
      Optics
      Laminates and Composite Materials

Distribution Statement : APPROVED FOR PUBLIC RELEASE