Accession Number : ADD016216
Title : Nanochannel Glass Matrix Used in Making Mesoscopic Structures.
Descriptive Note : Patent, Filed 12 Jun 92, patented 23 Nov 93,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Tonucci, Ronald J ; Justus, Brian L
Report Date : 23 Nov 1993
Pagination or Media Count : 21
Abstract : The present invention provides a method of forming a semiconductor device comprising the steps of: forming a glass block of an acid inert glass having acid etchable glass rods extending therethrough, the acid etchable glass rods having an average diameter of less than 1 micron; partially etching one end of the acid etchable rods surface of the glass block to form cavities in the glass block on one surface thereof having an average diameter of less than 1 micron; depositing material(s) in the cavities to form a semiconductor device. The present invention also provides a method for forming a semiconductor device in which the acid etchable glass rods are completely etched and the deposition material(s) is deposited to fill the nanochannels formed by the etching. The present invention also provides semiconductor devices made by these methods.
Descriptors : *GLASS, *SEMICONDUCTOR DEVICES, *PATENTS, *MATRIX MATERIALS, ACIDS, CAVITIES, DEPOSITION, ETCHING, MATERIALS, RODS, SURFACES, STRUCTURES
Subject Categories : Electrical and Electronic Equipment
Ceramics, Refractories and Glass
Distribution Statement : APPROVED FOR PUBLIC RELEASE