Accession Number : ADD016348

Title :   Volatile CVD Precursors Based on Copper Alkoxides and Mixed Group IIA-Copper Alkoxides.

Descriptive Note : Patent, Filed 10 Mar 93, patented 26 Apr 94,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Purdy, Andrew

Report Date : 26 Apr 1994

Pagination or Media Count : 4

Abstract : This invention relates to novel chemical compositions for use in chemical vapor deposition. More specifically, it relate s to fluorinated copper alkoxides and fluorinated calcium-copper, Strontium-Copper, and barium copper alkoxides, having superior physical properties for application in chemical vapor deposition to form thin films. The compounds should also be useful for the preparation of calcium, strontium, and barium-copper oxides by sol-gel processes. Chemical vapor deposition is a process in which one or several precursor compounds and reactant gases are introduced into a reactor in the vapor layer.

Descriptors :   *PATENTS, *COPPER COMPOUNDS, *CHEMICAL VAPOR DEPOSITION, *FLUORINATED HYDROCARBONS, *VOLATILITY, *THIN FILMS, *ALKYL RADICALS, CHEMICAL COMPOSITION, PRECURSORS, CALCIUM, STRONTIUM, BARIUM, OXIDES

Subject Categories : Physical Chemistry
      Inorganic Chemistry
      Organic Chemistry

Distribution Statement : APPROVED FOR PUBLIC RELEASE