Accession Number : ADD016354
Title : Substrate Temperature Control Apparatus and Technique for CVD Reactors.
Descriptive Note : Patent, Filed 18 May 93, patented 7 Jun 94,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Snail, Keith A ; Thorpe, Thomas P
Report Date : 07 Jun 1994
Pagination or Media Count : 13
Abstract : One of the critical experimental parameters affecting the quality and growth rate of chemical vapor deposition species, such as, diamond is the substrate temperature. An apparatus and technique for the precise control of the substrate temperature in a chemical vapor deposition environment has been developed. In a preferred embodiment, the technique uses a variable gas mixture in conjunction with the disclosed apparatus of the present invention to precisely control the temperature of the substrate to within at least +/-2O deg C. for extended periods of time and over large area substrates on the order of 1 in diameter or larger.
Descriptors : *SUBSTRATES, *PATENTS, *CHEMICAL VAPOR DEPOSITION, *CHEMICAL REACTIONS, *TEMPERATURE CONTROL, *GASES, CHEMICALS, DIAMETERS, DIAMONDS, ENVIRONMENTS, MIXTURES, PARAMETERS, QUALITY, RATES, TIME, VARIABLES
Subject Categories : Physical Chemistry
Air Condition, Heating, Lighting & Ventilating
Distribution Statement : APPROVED FOR PUBLIC RELEASE