Accession Number : ADD016355
Title : Selective Area Platinum Film Deposition.
Descriptive Note : Patent, Filed 30 Jul 93, patented 14 Jun 94,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Hsu, David S
Report Date : 14 Jun 1994
Pagination or Media Count : 8
Abstract : A process for selectively depositing platinum on a conductive or semiconductive substrate has the steps of: patterning a polyimide layer on the substrate to have exposed areas and unexposed areas; and, at an operating temperature and an operating pressure, flowing a platinum precursor gas over the substrate.
Descriptors : *PLATINUM, *FILMS, *DEPOSITION, *PATENTS, LAYERS, PRECURSORS, PRESSURE, SUBSTRATES, TEMPERATURE, CONDUCTIVITY, METALS, PATTERNS, GASES, LOW PRESSURE, CHEMICAL VAPOR DEPOSITION, MICROELECTRONICS
Subject Categories : Physical Chemistry
Electrical and Electronic Equipment
Coatings, Colorants and Finishes
Distribution Statement : APPROVED FOR PUBLIC RELEASE