Accession Number : ADD016355

Title :   Selective Area Platinum Film Deposition.

Descriptive Note : Patent, Filed 30 Jul 93, patented 14 Jun 94,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Hsu, David S

Report Date : 14 Jun 1994

Pagination or Media Count : 8

Abstract : A process for selectively depositing platinum on a conductive or semiconductive substrate has the steps of: patterning a polyimide layer on the substrate to have exposed areas and unexposed areas; and, at an operating temperature and an operating pressure, flowing a platinum precursor gas over the substrate.

Descriptors :   *PLATINUM, *FILMS, *DEPOSITION, *PATENTS, LAYERS, PRECURSORS, PRESSURE, SUBSTRATES, TEMPERATURE, CONDUCTIVITY, METALS, PATTERNS, GASES, LOW PRESSURE, CHEMICAL VAPOR DEPOSITION, MICROELECTRONICS

Subject Categories : Physical Chemistry
      Electrical and Electronic Equipment
      Inorganic Chemistry
      Coatings, Colorants and Finishes

Distribution Statement : APPROVED FOR PUBLIC RELEASE