Accession Number : ADD016419
Title : Compact Substrate Heater for Use in an Oxidizing Atmosphere.
Descriptive Note : Patent, Filed 19 May 93, patented 12 Jul 94,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Jones, Thomas E ; McGinnis, Wayne C ; Briggs, J S
Report Date : 12 Jul 1994
Pagination or Media Count : 8
Abstract : A compact heater is designed for the deposition of thin films at high temperatures in an oxidizing atmosphere or in vacuum. The heater is designed to accommodate a small-diameter load-lock system in an ultra-high-vacuum deposition chamber, and can operate in 0 to 1 atmosphere of oxygen up to at least 800 deg C. The compact design allows the heater, including a substantially isothermal substrate holder having the substrate affixed thereto, included temperature sensor and attached main body portion, to be loaded through a load-lock port with about a 2.5 inch inside diameter. Heat is generated resistively, and the substrates are heated directly by thermal conduction. The heater was designed specifically to heat substrates to precisely monitored temperatures during the growth of high-temperature superconducting thin films.
Descriptors : *ATMOSPHERES, *HEATERS, *SUBSTRATES, *THIN FILMS, *PATENTS, *OXIDIZERS, *THERMAL CONDUCTIVITY, CHAMBERS, DEPOSITION, DIAMETERS, HIGH TEMPERATURE, HOLDERS, OXYGEN, TEMPERATURE, ULTRAHIGH VACUUM, ISOTHERMS, COMPOSITE MATERIALS, FABRICATION
Subject Categories : Solid State Physics
Electricity and Magnetism
Distribution Statement : APPROVED FOR PUBLIC RELEASE