Accession Number : ADD016554

Title :   Method and System for Electron Beam Lithography.

Descriptive Note : Patent, Filed 13 May 92, patented 9 Aug 94,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Dobisz, Elizabeth A ; Marrian, Christie R ; Peckerar, Martin C ; Rhee, Kee W

Report Date : 09 Aug 1994

Pagination or Media Count : 8

Abstract : Improvement of resolution in terms of reducing minimum feature sizes and proximity effects on bulk substrates in high voltage electron beam lithography as applied to manufacture of electronic circuits from coated semiconductors involves the use of a dielectric layer interposed between an electrically semiconducting substrate and a resist layer. The dielectric layer functions to reduce the resist exposure resulting from the backscattered electrons coming from the substrate into the resist layer.

Descriptors :   *CIRCUITS, *ELECTRON BEAMS, *LITHOGRAPHY, *PATENTS, DIELECTRICS, ELECTRONICS, ELECTRONS, FUNCTIONS, HIGH VOLTAGE, LAYERS, RESOLUTION, SEMICONDUCTORS, SUBSTRATES, VOLTAGE, REDUCTION, SIZES(DIMENSIONS), BULK MATERIALS, COATINGS, BACKSCATTERING

Subject Categories : Particle Accelerators
      Optics
      Printing and Graphic Arts
      Electrical and Electronic Equipment

Distribution Statement : APPROVED FOR PUBLIC RELEASE