Accession Number : ADD017463

Title :   High Aspect Ratio Metal Microstructures and Method for Preparing the Same.

Descriptive Note : Patent, Filed 27 Apr 92, patented 30 Aug 94,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Georger, Jacque H , Jr ; Peckerar, Martin C ; Rebbert, Milton L ; Calvert, Jeffrey M ; Hickman, James J

Report Date : 30 Aug 1994

Pagination or Media Count : 17

Abstract : High aspect ratio metal microstructures may be prepared by a method involving (1) forming a layer of a photoresistance on a substrate; (2) exposing the layer to actinic radiation in an image wise manner and developing the exposed layer to obtain a surface which contains regions having no remaining photoresist and regions covered with photoresist; (3) metallizing the surface to form a layer of metal on the region of the surface having no remaining photoresist and on the sides of the regions of photoresist remaining on the surface; and (4) optionally, stripping the photoresist remaining on the surface. (MM)

Descriptors :   *METALS, *METAL COATINGS, *PHOTORESIST COATINGS, *PATENTS, *PHOTORESISTORS, *METALLIZING, SCANNING ELECTRON MICROSCOPES, MICROSTRUCTURE, SUBSTRATES, X RAYS, ELECTRON BEAMS, ELECTRON EMISSION, MICROELECTRONICS, CIRCUIT INTERCONNECTIONS, ASPECT RATIO, PHOTOLITHOGRAPHY

Subject Categories : Coatings, Colorants and Finishes
      Electrical and Electronic Equipment

Distribution Statement : APPROVED FOR PUBLIC RELEASE