Accession Number : ADD017470

Title :   Method of Forming Thin Films on Substrates at Low Temperatures.

Descriptive Note : Patent, Filed 28 Feb 94, patented 21 Mar 95,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Aklufi, Monti E

Report Date : 21 Mar 1995

Pagination or Media Count : 7

Abstract : A method is provided for forming thin films, such as high temperature superconductors, on a surface of a substrate using pulsed microwaves to control substrate temperature. The method includes vaporizing a liquid source to form a series of vapor pulses, irradiating the vapor pulses and a makeup gas with pulsed microwaves, and exposing the surface of the substrate to the irradiated mixture to form a thin film on the surface. The microwaves may be pulsed to coincide with the arrival of the vapor pulses at the substrate, thus reducing the amount of material consumed and the amount of waste. Further, the plasma may be closely confined to the substrate with a dielectric waveguide to reduce the power required for irradiating for mixture and to prevent the formation of stray deposits on surfaces enclosing the substrate. jg

Descriptors :   *LOW TEMPERATURE, *THIN FILMS, *SUBSTRATES, *IRRADIATION, *PATENTS, SOURCES, LIQUIDS, VAPORS, PLASMAS(PHYSICS), DIELECTRICS, WAVEGUIDES, MICROWAVES, MIXTURES, SURFACES, DEPOSITS, PULSES, HIGH TEMPERATURE SUPERCONDUCTORS

Subject Categories : Solid State Physics
      Laminates and Composite Materials
      Electricity and Magnetism
      Thermodynamics

Distribution Statement : APPROVED FOR PUBLIC RELEASE