Accession Number : ADD017650

Title :   Selective Vapor Deposition Using Films Cross-Reference to Related Application.

Descriptive Note : Patent Application, Filed 4 Apr 95,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Potochnik, Stephen J ; Calvert, Jeffrey M ; Pehrsson, Pehr E ; Hsu, David S

PDF Url : ADD017650

Report Date : 04 Apr 1995

Pagination or Media Count : 51

Abstract : The present invention is directed to the selective and non-selective vapor deposition of materials upon substrates. Vapor deposition is accomplished by providing a substrate having one or more chemical groups on its surface, the chemical groups being capable of bonding to a deposition catalyst, contacting a deposition catalyst to the chemical groups of the substrate and vapor depositing a material upon the catalyst via vapor deposition. The vapor deposition may also be selective vapor deposition. jg p.49

Descriptors :   *PATENT APPLICATIONS, *FILMS, *VAPOR DEPOSITION, CHEMICALS, COMPOSITE MATERIALS, SUBSTRATES, DEPOSITION, CATALYSTS, SELECTION

Subject Categories : Inorganic Chemistry
      Physical Chemistry
      Laminates and Composite Materials

Distribution Statement : APPROVED FOR PUBLIC RELEASE