Accession Number : ADD017651

Title :   Reactive Oxygen-Assisted Ion Implantation into Metals and Products Made Therefrom.

Descriptive Note : Patent Application, Filed 13 Sep 94,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Sartwell, Bruce D ; Natishan, Paul

PDF Url : ADD017651

Report Date : 13 Sep 1994

Pagination or Media Count : 20

Abstract : A method of ion implantation using oxygen backfill and a modified surface layer formed therefrom are provided. The method of ion implantation includes the steps of placing a substrate metal in an ion implantation vacuum chamber, introducing oxygen into the ion implantation vacuum chamber and directing a beam of ions at the substrate metal. The modified surface includes a substrate metal and implanted atoms at a surface of the substrate metal. The implanted atoms are integrated with the substrate metal. The substrate metal has an implanted atom concentration of at least 5 atomic % to a depth of over 250 A.

Descriptors :   *METALS, *PATENT APPLICATIONS, *ION IMPLANTATION, *OXYGEN, LAYERS, REACTIVITIES, SUBSTRATES, ATOMS, VACUUM CHAMBERS, OXYGEN, SURFACE PROPERTIES

Subject Categories : Inorganic Chemistry
      Physical Chemistry
      Atomic and Molecular Physics and Spectroscopy
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE