Accession Number : ADD017651
Title : Reactive Oxygen-Assisted Ion Implantation into Metals and Products Made Therefrom.
Descriptive Note : Patent Application, Filed 13 Sep 94,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Sartwell, Bruce D ; Natishan, Paul
PDF Url : ADD017651
Report Date : 13 Sep 1994
Pagination or Media Count : 20
Abstract : A method of ion implantation using oxygen backfill and a modified surface layer formed therefrom are provided. The method of ion implantation includes the steps of placing a substrate metal in an ion implantation vacuum chamber, introducing oxygen into the ion implantation vacuum chamber and directing a beam of ions at the substrate metal. The modified surface includes a substrate metal and implanted atoms at a surface of the substrate metal. The implanted atoms are integrated with the substrate metal. The substrate metal has an implanted atom concentration of at least 5 atomic % to a depth of over 250 A.
Descriptors : *METALS, *PATENT APPLICATIONS, *ION IMPLANTATION, *OXYGEN, LAYERS, REACTIVITIES, SUBSTRATES, ATOMS, VACUUM CHAMBERS, OXYGEN, SURFACE PROPERTIES
Subject Categories : Inorganic Chemistry
Atomic and Molecular Physics and Spectroscopy
Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE