Accession Number : ADD018103
Title : Apparatus and Method Using Low-Voltage and/or Low-Current Scanning Probe Lithography.
Descriptive Note : Patent, Filed 30 Jun 93, patented 2 Apr 96,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Marrian, Christie R ; Snow, Eric S ; Dobisz, Elizabeth A
Report Date : 02 Apr 1996
Pagination or Media Count : 9
Abstract : An apparatus and method lithographically patterns an imaging layer using a predetermined pattern. The apparatus includes a cantilever having a tip attached thereto, which tip includes a conductive or semiconductive material. The apparatus also includes a scanning probe controller connected to the cantilever, which maintains the tip in contact with the imaging layer to be patterned. Substantially while the scanning probe controller maintains the tip in contact with the imaging layer, a volt age and/or current generator coupled to the tip selectively generates a voltage and/or current between the tip and the imaging layer to affect a physical change in the imaging layer based on the predetermined pattern. The physical change in the imaging layer can be exploited to fabricate integrated circuits, lithographic masks or micromechanical devices, for example. The scanning probe controller can also measure the topographical change in the imaging layer caused by the physical change using the same cantilever and tip.
Descriptors : *INTEGRATED CIRCUITS, *LITHOGRAPHY, *PATENTS, SCANNING, CONTROL, LAYERS, MATERIALS, ELECTRONIC SCANNERS, SEMICONDUCTORS, TOPOGRAPHY, IMAGES, ELECTRIC CURRENT, MASKS
Subject Categories : Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE