Accession Number : ADD018118

Title :   Apparatus and Method for Achieving Growth-Etch Deposition of Diamond Using a Chopped Oxygen-Acetylene Flame.

Descriptive Note : Patent, Filed 4 Nov 94, patented 9 Apr 96,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Thorpe, Thomas P , Jr ; Weimer, Ronald A

Report Date : 09 Apr 1996

Pagination or Media Count : 13

Abstract : A novel apparatus and method for the cyclic growth-etch deposition of diamond on a substrate by flame chemical vapor deposition (CVD) is developed. The cyclic growth-etch diamond deposition is accomplished by placing a suitable substrate to be coated under a CVD flame and providing a disk or face plate or other shapes having one or more teeth (or holes) wherein upon rotation of the disk, or face plate or other shape, the teeth attached to the disk, or face plate, or other shape obstruct the path of the CVD flame from contacting the substrate at a desired time scale of T(sub growth) and t(sub cycle) to produce high quality (FWHM of 1-3.5/cm) diamond.

Descriptors :   *GROWTH(GENERAL), *DIAMONDS, *ETCHING, *OXYGEN, *ACETYLENE, *FLAMES, CHEMICAL VAPOR DEPOSITION, SUBSTRATES, DISKS, ROTATION, PATENTS, FACEPLATES

Subject Categories : Inorganic Chemistry
      Physical Chemistry
      Crystallography
      Combustion and Ignition

Distribution Statement : APPROVED FOR PUBLIC RELEASE