Accession Number : ADD018186
Title : In-Situ Monitoring and Feedback Control of Metalorganic Precursor Delivery.
Descriptive Note : Patent Application, filed 6 Oct 95,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : DeSisto, William J ; Rappoli, Brian
PDF Url : ADD018186
Report Date : 06 Oct 1995
Pagination or Media Count : 23
Abstract : The in-situ monitoring of metalorganic precursor delivery in a metalorganic chemical vapor deposition oxide system in high temperature super conductors (HTSC) film growth is accomplished by utilizing the distinct absorbance bands for metalorganic compounds. As an ultraviolet-visible light beam is passed through an effluent metalorganic gas stream the relative change in ultraviolet-visible absorbance of the ultraviolet-visible light beam passing through the effluent metalorganic gas stream is monitored. Stoichiometry control is achieved by feeding back absorbance data to a controlling parameter such as carrier gas mass flow rate, thus stabilizing fluctuations in source concentration in the bubble effluent from a computer or similar monitoring device. Such an apparatus and method improves the stoichiometry control of mixed metal oxide film deposition and increases the manufacturability of thin films.
Descriptors : *ORGANOMETALLIC COMPOUNDS, *CHEMICAL VAPOR DEPOSITION, *VAPOR PHASES, *ULTRAVIOLET OPTICAL MATERIALS, STABILIZATION, CONTROL, DELIVERY, MONITORING, PRECURSORS, GROWTH(GENERAL), HIGH TEMPERATURE, SUPERCONDUCTORS, THIN FILMS, FILMS, VARIATIONS, FEEDBACK, BUBBLES, MONITORS, EFFLUENTS, STOICHIOMETRY, GAS FLOW, ULTRAVIOLET RECEIVERS
Subject Categories : Inorganic Chemistry
Laminates and Composite Materials
Atomic and Molecular Physics and Spectroscopy
Distribution Statement : APPROVED FOR PUBLIC RELEASE