Accession Number : ADD018186

Title :   In-Situ Monitoring and Feedback Control of Metalorganic Precursor Delivery.

Descriptive Note : Patent Application, filed 6 Oct 95,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : DeSisto, William J ; Rappoli, Brian

PDF Url : ADD018186

Report Date : 06 Oct 1995

Pagination or Media Count : 23

Abstract : The in-situ monitoring of metalorganic precursor delivery in a metalorganic chemical vapor deposition oxide system in high temperature super conductors (HTSC) film growth is accomplished by utilizing the distinct absorbance bands for metalorganic compounds. As an ultraviolet-visible light beam is passed through an effluent metalorganic gas stream the relative change in ultraviolet-visible absorbance of the ultraviolet-visible light beam passing through the effluent metalorganic gas stream is monitored. Stoichiometry control is achieved by feeding back absorbance data to a controlling parameter such as carrier gas mass flow rate, thus stabilizing fluctuations in source concentration in the bubble effluent from a computer or similar monitoring device. Such an apparatus and method improves the stoichiometry control of mixed metal oxide film deposition and increases the manufacturability of thin films.

Descriptors :   *ORGANOMETALLIC COMPOUNDS, *CHEMICAL VAPOR DEPOSITION, *VAPOR PHASES, *ULTRAVIOLET OPTICAL MATERIALS, STABILIZATION, CONTROL, DELIVERY, MONITORING, PRECURSORS, GROWTH(GENERAL), HIGH TEMPERATURE, SUPERCONDUCTORS, THIN FILMS, FILMS, VARIATIONS, FEEDBACK, BUBBLES, MONITORS, EFFLUENTS, STOICHIOMETRY, GAS FLOW, ULTRAVIOLET RECEIVERS

Subject Categories : Inorganic Chemistry
      Physical Chemistry
      Laminates and Composite Materials
      Atomic and Molecular Physics and Spectroscopy

Distribution Statement : APPROVED FOR PUBLIC RELEASE