Accession Number : ADD018208

Title :   Method for Monitoring Surface Stress.

Descriptive Note : Patent Application, Filed 27 Aug 96,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : Nadolink, Richard H

PDF Url : ADD018208

Report Date : 27 Aug 1996

Pagination or Media Count : 12

Abstract : A piece of single crystal silicon is embedded in a material such that the silicon is flush with the surface thereof. The silicon is illuminated with infrared radiation having a wavelength in the range of 800-1100 nanometers. Isochromatic fringe patterns projected from the silicon are monitored as a direct indication of the amount of stress experienced at the surface.

Descriptors :   *PATENT APPLICATIONS, *STRAIN GAGES, *INFRARED DETECTORS, STRESS STRAIN RELATIONS, MONITORING, SINGLE CRYSTALS, INFRARED RADIATION, DIFFRACTION ANALYSIS

Subject Categories : Infrared Detection and Detectors
      Mechanics

Distribution Statement : APPROVED FOR PUBLIC RELEASE