Accession Number : ADD018208
Title : Method for Monitoring Surface Stress.
Descriptive Note : Patent Application, Filed 27 Aug 96,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC
Personal Author(s) : Nadolink, Richard H
PDF Url : ADD018208
Report Date : 27 Aug 1996
Pagination or Media Count : 12
Abstract : A piece of single crystal silicon is embedded in a material such that the silicon is flush with the surface thereof. The silicon is illuminated with infrared radiation having a wavelength in the range of 800-1100 nanometers. Isochromatic fringe patterns projected from the silicon are monitored as a direct indication of the amount of stress experienced at the surface.
Descriptors : *PATENT APPLICATIONS, *STRAIN GAGES, *INFRARED DETECTORS, STRESS STRAIN RELATIONS, MONITORING, SINGLE CRYSTALS, INFRARED RADIATION, DIFFRACTION ANALYSIS
Subject Categories : Infrared Detection and Detectors
Distribution Statement : APPROVED FOR PUBLIC RELEASE