Accession Number : ADD018627
Title : Large Area Plasma Processing System (LAPPS).
Descriptive Note : Patent Application, Filed 27 Aug 97,
Corporate Author : OFFICE OF NAVAL RESEARCH ARLINGTON VA
Personal Author(s) : Meger, Robert A ; Fernsler, Richard F ; Lampe, Martin ; Manheimer, W M
PDF Url : ADD018627
Report Date : 27 Aug 1997
Pagination or Media Count : 19
Abstract : The large area plasma processing system (LAPPS) is a system wherein an electron beam is used to produce a plasma. A large area uniform plasma is produced where length and width can be comparable (10's-100's of cm) and very much larger than the plasma thickness (approx. 1 cm). The plasma distribution is created independent of the surface to be processed and the bias applied to the surface. The beam-produced plasma has a low intrinsic electron and excitation temperature plasma, allowing the process to be conducted with better control of free radical production. A material, such as a substrate, being processed may be placed in close proximity to plasma with controlled ion bombardment or without substantial bombardment by energetic ions. The system also offers a large available area for gas inflow and removal from the processing chamber and cathode chamber so as not to contaminate the material being processed or damage the cathode.
Descriptors : *PATENT APPLICATIONS, *PLASMAS(PHYSICS), *ELECTRON BEAMS, SUBSTRATES, FREE RADICALS, GAS FLOW, ION BOMBARDMENT
Subject Categories : Electric Power Production and Distribution
Plasma Physics and Magnetohydrodynamics
Distribution Statement : APPROVED FOR PUBLIC RELEASE