Accession Number : ADD018711

Title :   In-Situ Monitoring and Feedback Control of Metalorganic Precursor Delivery

Descriptive Note : Patent, Filed 6 Oct 95, patented 29 Jul 97

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s) : DeSisto, William J ; Rappoli, Brian J

Report Date : 29 Jul 1997

Pagination or Media Count : 11

Abstract : The in-situ monitoring of metal organic precursor delivery in a metal organic chemical vapor deposition oxide system in high temperature super conductors (HTSC) film growth is accomplished by utilizing the distinct absorbance bands for metal organic compounds. As an ultraviolet-visible light beam is passed through an effluent metal organic gas stream the relative change in ultraviolet-visible absorbance of the ultraviolet-visible light beam passing through the effluent metal organic gas stream is monitored. Stoichiometry control is achieved by feeding back absorbance data to a controlling parameter such as carrier gas mass flow rate, thus stabilizing fluctuations in source concentration in the bubble effluent from a computer or similar monitoring device. Such an apparatus and method improves the stoichiometry control of mixed metal oxide film deposition and increases the manufacturability of thin films.

Descriptors :   *ORGANOMETALLIC COMPOUNDS, *CHEMICAL VAPOR DEPOSITION, *PATENTS, PRECURSORS, HIGH TEMPERATURE, SUPERCONDUCTORS, THIN FILMS, EPITAXIAL GROWTH, STOICHIOMETRY, GAS FLOW, ULTRAVIOLET SPECTRA

Subject Categories : Inorganic Chemistry
      Physical Chemistry
      Laminates and Composite Materials

Distribution Statement : APPROVED FOR PUBLIC RELEASE