Accession Number : ADP001518

Title :   Photoluminescence from Work Surface Layers and Frequency Instability of Quartz Resonators,

Corporate Author : HEBREW UNIV JERUSALEM (ISRAEL) RACAH INST OF PHYSICS

Personal Author(s) : Halperin,A. ; Katz,S. ; Ronen,M.

Report Date : 1982

Pagination or Media Count : 6

Abstract : The disturbed surface layers produced by polishing and lapping affect considerably the frequency stability of quartz resonators. The present work describes the use of photoluminescence (PL) emitted from these layers for understanding the nature of the frequency instability. Experiments included measurements after successive etchings, thermal treatments and ultrasonic cleaning. The effects on the PL were compared to those on the resonator frequency. Our results support strongly the contamination mechanism for the frequency instability due to the works layer in quartz resonators. It seems that vapors (including water) absorbed in the cracks and grooves of the disturbed layers play an important role in the frequency instability due to the worked layers.

Descriptors :   *Frequency, *Control, *Symposia, *Quartz resonators, *Photoluminescence, Layers, Etching, Stability, Frequency stabilizers, Thermal properties, Polishing

Distribution Statement : APPROVED FOR PUBLIC RELEASE