Accession Number : ADP001658

Title :   Ion-Induced Reactions in Thin Film Structures of Al and Near-Noble Metals,

Corporate Author : CORNELL UNIV ITHACA NY DEPT OF MATERIALS SCIENCE AND ENGINEERING

Personal Author(s) : Nastasi,Mike ; Hung,L. S. ; Mayer,J. W.

Report Date : 1983

Pagination or Media Count : 10

Abstract : Thin film Pd/Al, Ni/Al and Pt/Al interdigitated samples, either thermally reacted to form intermetallic compounds or left in their unreacted state, were irradiated with Xe ions to doses of 2 x 10 to the 14th power to 2 x 10 to the 15th power Xe ions/squared cm. Only crystalline compounds of the simplest structure, cP2 could be identified by electron diffraction. Compounds of a more complex structure than cP2 decompose upon irradiation into an amorphous mixture and elemental constituents. Table 1 presents a summary of the results found in all three metal/Al systems. (Author)

Descriptors :   *Ion beams, *Mixing, *Ion implantation, *Workshops, *Metal films, *Electron diffraction, Thin films, Xenon, Thermal properties, Reaction kinetics, Ions, Decomposition, Amorphous materials, Spectral lines

Distribution Statement : APPROVED FOR PUBLIC RELEASE