Accession Number : ADP002594
Title : Ultraviolet-Laser Photodeposition,
Corporate Author : MASSACHUSETTS INST OF TECH LEXINGTON LINCOLN LAB
Personal Author(s) : Ehrlich,D. J. ; Tsao,J. Y.
Report Date : 1982
Pagination or Media Count : 12
Abstract : Ultraviolet laser light can be used to initiate low-temperature chemical processing of surfaces by reactions which are similar in many respects to those active in plasma techniques. Such processing has been under investigation over the last several years. A series of new techniques have been developed for thin-film deposition, for etching, and for doping of semiconductors by processes based on photolytic reactions at a gas-solid interface. Gas-phase and surface chemical reactions are controlled by a UV laser, while the temperature of the surface is independently controlled and can typically remain near room temperature. Experiments on UV excimer laser deposition of similar materials suggest that the same approach may be useful for rapid deposition of hard carbon films. In this summary we will review this new technology.
Descriptors : *Coatings, *Carbon, *Symposia, *Optical coatings, Laser applications, Ultraviolet lasers, Films, Deposition, Thin films
Distribution Statement : APPROVED FOR PUBLIC RELEASE