Accession Number : ADP006639
Title : Recent Advances in the Deposition of Ferroelectric Thin Films,
Corporate Author : PENNSYLVANIA STATE UNIV UNIVERSITY PARK MATERIALS RESEARCH LAB
Personal Author(s) : Krupanidhi, S. B.
Report Date : 05 APR 1991
Pagination or Media Count : 20
Abstract : Recent developments in ferroelectric thin film deposition involving plasma based approaches, are described, which include (a) multi-magnetron. sputter deposition, (b) Multi-ion-beam reactive sputter (MIBERS) deposition, (c) Pulsed excimer laser ablation and (d) ECR (Electron cyclotron resonance) plasma assisted deposition. These methods commonly prevailed intrinsic low energy ion bombardment during the growth process, which may be used for the control over composition, crystallization temperature and microstructure. A low energy (60 - 75 eV) ion bombardment of the ferroelectric Pb(Zr,Ti)03 thin films indicated a reduction in the phase formation/crystallization temperature, improved the electrical properties, microstructure and the surface smoothness. Discussion is presented emphasizing the effects of low energy bombardment in different deposition processes. Recent findings using rapid thermal annealing process are also described.
Descriptors : *THIN FILMS, *DEPOSITION, *FERROELECTRIC MATERIALS, ABLATION, ANNEALING, CONTROL, CRYSTALLIZATION, CYCLOTRONS, DEPOSITION, ELECTRICAL PROPERTIES, EXCIMERS, ION BEAMS, ION BOMBARDMENT, IONS, LASERS, LOW ENERGY, MAGNETRONS, MICROSTRUCTURE, PHASE, REDUCTION, SURFACES, TEMPERATURE, CYCLOTRON RESONANCE, SPUTTERING, LEAD TITANATES, ZIRCONATES.
Subject Categories : Electricity and Magnetism
Electrical and Electronic Equipment
Ceramics, Refractories and Glass
Mfg & Industrial Eng & Control of Product Sys
Distribution Statement : APPROVED FOR PUBLIC RELEASE