Accession Number : ADP006681

Title :   Ferroelectric Pb(Zr,Ti)03 Thin Films Prepared by Gas Jet Deposition,

Corporate Author : SCHMITT TECHNOLOGY ASSOCIATES NEW HAVEN CT

Personal Author(s) : Hwang, C. L. ; Chen, B. A. ; Ma, T. P. ; Golz, J. W. ; Di, Y. D.

Report Date : 05 APR 1991

Pagination or Media Count : 9

Abstract : Lead-zirconate-titanate thin films were successfully codeposited in a modest vacuum environment using a novel Gas Jet Deposition (GJD) process. The GJD process utilizes supersonic carrier gas jets to efficiently transfer the depositing species to substrates. High throughput, large coating area, and easy control of film stoichiometry make the GJD unique among various deposition techniques. GJD deposited PZT films exhibit excellent ferroelectric properties. Unlike other films reported in the literature, only one preferred orientation (L 10) was found in our films grown on Pt electrode. Fatigue tests show that the films are quite stable under ac voltage stress.

Descriptors :   *DEPOSITION, COATINGS, CONTROL, ELECTRODES, ENVIRONMENTS, LEAD TITANATES, STOICHIOMETRY, SUBSTRATES, TEST AND EVALUATION, THIN FILMS, THROUGHPUT, TITANATES, TRANSFER, VACUUM, VOLTAGE, ZIRCONATES, FATIGUE(MECHANICS), PLATINUM.

Subject Categories : Ceramics, Refractories and Glass
      Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE