Accession Number : ADP006692

Title :   Liquid Source CVD,

Corporate Author : SYMETRIX CORP COLORADO SPRINGS CO

Personal Author(s) : McMillan, L. D. ; Paz De Araujo, C. A. ; Roberts, T. ; Cuchiaro, J.

Report Date : 05 APR 1991

Pagination or Media Count : 9

Abstract : This work entails an investigation Of a new method for depositing complex thin films by, injecting stoichiometrically correct liquid sources into a vacuum chamber such that thin films are formed on silicon substrates at room temperature under closely controlled conditions.

Descriptors :   *THIN FILMS, *VAPOR DEPOSITION, LIQUIDS, ROOM TEMPERATURE, SILICON, SUBSTRATES, TEMPERATURE, VACUUM CHAMBERS, WORK.

Subject Categories : Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE