Accession Number : ADP007228
Title : Soft-X-Ray Reduction Lithography Using a Reflection Mask,
Corporate Author : NIPPON TELEGRAPH AND TELEPHONE CORP ATSUGI LSI LABS
Personal Author(s) : Kinoshita, H. ; Kurihara, K. ; Mizota, T. ; Haga, T. ; Torii, Y.
Report Date : 22 MAY 1992
Pagination or Media Count : 5
Abstract : A soft-x-ray reduction lithography using a multilayer reflection mask has been developed. To obtain a high throughput and a large exposure area, a reduction system consisting of two-mirror optics and a reflection mask with a scanning mechanism is adopted as a first generation system. A full 4-inch wafer reflection mask with high contract and an uniform quality throughout has been fabricated using a new process. Mo/B4C multilayer is used to shorten the exposure wavelength and to refine interfaces of multilayer and to obtain a fine pattern. And fine patterns less than 0.2 um at a demagnification of 1/8 have been obtained with a reflection mask and Mo/B4C multilayer optics in the area of 0.8 mm x0.15 mm.
Descriptors : *LITHOGRAPHY, SOFT X RAYS, REFLECTANCE, MOLYBDENUM COMPOUNDS.
Subject Categories : Printing and Graphic Arts
Distribution Statement : APPROVED FOR PUBLIC RELEASE