Accession Number : ADP007230
Title : Throughput Estimate of an X-Ray Projection Lithography System,
Corporate Author : HITACHI LTD TOKYO (JAPAN) CENTRAL RESEARCH LAB
Personal Author(s) : Itou, Masaaki ; Terasawa, Tsueno ; Moriyama, Shigeo
Report Date : 22 MAY 1992
Pagination or Media Count : 4
Abstract : The feasibility of X-ray projection lithography is discussed with emphasis on throughput issues. A lithography system using 13nm radiation from a compact storage ring was designed. This system consists of a grazing incidence condenser mirror, a multilayer condenser mirror, a multilayer reflection mask , an imaging system with four multilayer mirrors, and an X-ray window. Calculations show that the X-ray power incident onto that the X-ray power incident onto a wafer is 0.5mW. A highly sensitive resist is required to a achieve practical wafer throughput.
Descriptors : *LITHOGRAPHY, SOFT X RAYS, RANDOM ACCESS COMPUTER STORAGE.
Subject Categories : Photography
Distribution Statement : APPROVED FOR PUBLIC RELEASE