Accession Number : ADP007230

Title :   Throughput Estimate of an X-Ray Projection Lithography System,

Corporate Author : HITACHI LTD TOKYO (JAPAN) CENTRAL RESEARCH LAB

Personal Author(s) : Itou, Masaaki ; Terasawa, Tsueno ; Moriyama, Shigeo

Report Date : 22 MAY 1992

Pagination or Media Count : 4

Abstract : The feasibility of X-ray projection lithography is discussed with emphasis on throughput issues. A lithography system using 13nm radiation from a compact storage ring was designed. This system consists of a grazing incidence condenser mirror, a multilayer condenser mirror, a multilayer reflection mask , an imaging system with four multilayer mirrors, and an X-ray window. Calculations show that the X-ray power incident onto that the X-ray power incident onto a wafer is 0.5mW. A highly sensitive resist is required to a achieve practical wafer throughput.

Descriptors :   *LITHOGRAPHY, SOFT X RAYS, RANDOM ACCESS COMPUTER STORAGE.

Subject Categories : Photography

Distribution Statement : APPROVED FOR PUBLIC RELEASE