Accession Number : ADP007231
Title : Design and Analysis of Multimirror Soft-X-Ray Projection Lithography Systems,
Corporate Author : ALABAMA UNIV IN BIRMINGHAM
Personal Author(s) : Shealy, David L. ; Wang, Cheng
Report Date : 22 MAY 1992
Pagination or Media Count : 5
Abstract : A differential equation method has been developed for the design of soft x-ray projection lithography systems. This method yields numerical values for the sag and slope of two surfaces within a multi-mirror projection system such that the Abbe Sine condition and the constant optical path length condition are satisfied. Application of this design method to three- and four-mirror systems is in progress. Results are compared to optical performance of similar systems designed by conventional methods.
Descriptors : *LITHOGRAPHY, SOFT X RAYS, OPTICAL PROPERTIES, CHIPS(ELECTRONICS), JAPAN.
Subject Categories : Photography
Distribution Statement : APPROVED FOR PUBLIC RELEASE