Accession Number : ADP007232

Title :   Illumination Requirements for Optical Projectors and How to Think about Them,

Corporate Author : IBM RESEARCH LAB YORKTOWN HEIGHTS NY

Personal Author(s) : Goodman, Douglas S.

Report Date : 22 MAY 1992

Pagination or Media Count : 3

Abstract : A fundamental requirement of chip lithography is that patterns be imaged identically everywhere in the field. the illumination should be arranged to achieve this end by compensating, insofar as possible, for variations caused by the rest of the system. These includes variation of power/area, direction, polarization, and spectral distribution. The illumination should also be configured so that patterns are imaged the same way regardless of their orientations. Full telecentricity is achieved only if the illumination, as well as the imaging lens, is telecentric.

Descriptors :   *LITHOGRAPHY, OPTICAL PROPERTIES, ILLUMINATION, POLARIZATION.

Subject Categories : Photography

Distribution Statement : APPROVED FOR PUBLIC RELEASE