Accession Number : ADP007237
Title : Reflection Mask Technology for Soft-X-Ray Projection Lithography,
Corporate Author : LAWRENCE LIVERMORE NATIONAL LAB CA
Personal Author(s) : Hawryluk, A. M. ; Ceglio, N. M. ; Phillion, D. W. ; Gaines, D. P. ; Browning, R.
Report Date : 22 MAY 1992
Pagination or Media Count : 36
Abstract : Soft X-ray Projection Lithography (SXPL) may be used to fabricate high resolution structures for future integrated circuits. This technique will use a reflection mask which is a substrate coated with an x-ray multilayer mirror and patterned with a thin layer of x-ray absorber. Mask patterning processes must not degrade the reflectivity of the x-ray mirror and mask repair techniques must be developed.
Descriptors : *LITHOGRAPHY, OPTICAL IMAGES, REFLECTANCE, COATINGS.
Subject Categories : Photography
Distribution Statement : APPROVED FOR PUBLIC RELEASE