Accession Number : ADP007238

Title :   Design of an Extended Image Field Soft-X-Ray Projection System,

Corporate Author : STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE AMSTERDAM (NETHERLANDS) INS TITUUT VOOR ATOOM EN MOLECUULFYSICA

Personal Author(s) : Bijkerk, F. ; Voorma, H. -J. ; Puik, E. J. ; Louis, E. ; Van Dorssen, G. E.

Report Date : 22 MAY 1992

Pagination or Media Count : 3

Abstract : A soft x-ray projection system has been designed, consisting of all-reflectance multilayer optics. The design enables 0.1 micron resolution over a wide circular image field of 12.5 mm2. Optical systems for X-ray projection lithography use various normal-incidence geometries to realize sub-0.1 micron resolution with a depth of focus of 0.5 micron. To meet all other lithography imaging requirements, with respect to telecentricity, distortion, and image field size, the number of components in such a design can be as high as five, often including aspherical elements.

Descriptors :   *LITHOGRAPHY, REFLECTANCE, OPTICS, GEOMETRY, MIRRORS.

Subject Categories : Photography

Distribution Statement : APPROVED FOR PUBLIC RELEASE