Accession Number : ADP007241
Title : Source Issues Relevant to X-Ray Lithography,
Corporate Author : CALIFORNIA UNIV BERKELEY LAWRENCE BERKELEY LAB
Personal Author(s) : Nguyen, Khanh ; Attwood, David ; Gustafson, T. K.
Report Date : 22 MAY 1992
Pagination or Media Count : 6
Abstract : Considerations of the various issues relating to radiation sources for x-ray lithography are presented, focusing on two leading candidates-laser-produced plasma and synchrotron radiation sources. Issues to be addressed include power requirements of an x-ray source, deliverable power to wafer for both synchrotrons and laser plasma sources, and the requirement for collection solid angle and conversion efficiency for laser plasma sources. In our analysis, we attempt to bring out the relative merits of the sources and the advances necessary to make them viable for future x-ray lithographic systems.
Descriptors : *LITHOGRAPHY, WAFERS, X RAYS, HIGH POWER, SOURCES, REFLECTIVITY.
Subject Categories : Photography
Distribution Statement : APPROVED FOR PUBLIC RELEASE