Accession Number : ADP007244

Title :   XUV Conversion Efficiency in a Low-Intensity KrF Laser Plasma for Projection Lithography,

Corporate Author : SANDIA NATIONAL LABS ALBUQUERQUE NM

Personal Author(s) : Rockett, Paul D. ; Hunter, John A. ; Kensek, Ron ; Olson, Richard E. ; Kubiak, Glenn D.

Report Date : 22 MAY 1992

Pagination or Media Count : 4

Abstract : Measurements of XUV conversion efficiency in the 2028OeV range were made on a low intensity (7 x 1 O10 W/ cm2) KrF laser-produced plasma with seven targets of varying Z. Novel mass-limited targets were studied to develop ultra-low debris laser-targets for projection lithography.

Descriptors :   *LASER TARGETS, *LITHOGRAPHY, CONVERSION, DEBRIS, EFFICIENCY, LASERS, MASS, MEASUREMENT, TARGETS.

Subject Categories : Photography

Distribution Statement : APPROVED FOR PUBLIC RELEASE