Accession Number : ADP007245
Title : Interface Imperfections in Metal/Si X-Ray Multilayer Structures,
Corporate Author : AT AND T BELL LABS MURRAY HILL NJ
Personal Author(s) : Windt, David L. ; Hull, R. ; Waskiewicz, W. K.
Report Date : 22 MAY 1992
Pagination or Media Count : 5
Abstract : The structural and optical properties of optimized Mo/Si and Ru/Si X-ray multilayers prepared by sputter deposition have been examined using high-resolution TEM, optical profilometry, and X-ray and soft X-ray reflectance. In addition, the effect of sputter gas pressure on the structure and performance of Ru/Si multilayers has been investigated using the same techniques. We find that, similar to previous results for Mo/Si, lower pressure results in smoother layers. For optimized multilayers, interfacial roughness is negligible compared to interfacial diffuseness-, the presence of amorphous interlayer regions in both of these systems is the major cause of reduced reflectance. The growth mechanism associated with these interlayers is unclear, though it seems likely that it is a diffusion process rather than the result of a ballistic effect.
Descriptors : *SOFT X RAYS, ADDITION, DEPOSITION, HIGH RESOLUTION, LAYERS, OPTICAL PROPERTIES, PRESSURE, REFLECTANCE, RESOLUTION, STRUCTURES, X RAYS, LITHOGRAPHY.
Subject Categories : Photography
Distribution Statement : APPROVED FOR PUBLIC RELEASE