Accession Number : ADP007252

Title :   Surface-Imaging Lithography,

Corporate Author : MASSACHUSETTS INST OF TECH LEXINGTON LINCOLN LAB

Personal Author(s) : Hartney, Mark A.

Report Date : 22 MAY 1992

Pagination or Media Count : 4

Abstract : Surface-imaging lithography is a technique which was first described by Taylor et al. 1 nearly ten years ago. In this approach, a pattern is defined at the surface or near-surface regions of a resist rather than throughout the entire resist thickness. Surface-imaging can eliminate problems such as reflectivity variations due to different substrates or topography in optical lithography and backscattering in electron-beam lithography 2. The use of surface-imaging has also proven beneficial for deep-UV optical lithography, where the high absorbance of most resists necessitates such an approach. Resist absorption is also problematic for projection printing with soft x-ray radiation; the 1/e attenuation length ranges from 300 nm for 13.5-nm x-rays to less than 100 nm with 39-nm x-rays 3.

Descriptors :   *LITHOGRAPHY, ABSORPTION, APPROACH, ATTENUATION, BACKSCATTERING, ELECTRON BEAMS, ELECTRONS, LENGTH, PATTERNS, PRINTING, RADIATION, REFLECTIVITY, REGIONS, SOFT X RAYS, SUBSTRATES, SURFACES, THICKNESS, TOPOGRAPHY, VARIATIONS, X RAYS.

Subject Categories : Photography

Distribution Statement : APPROVED FOR PUBLIC RELEASE