Accession Number : ADP007253
Title : Resist Characterization at Soft-X-Ray Wavelengths,
Corporate Author : AT AND T BELL LABS HOLMDEL NJ
Personal Author(s) : Kubiak, G. D. ; Kneedler, E. M. ; Berger, K. W. ; Stulen, R. H. ; Bjorkholm, J. E.
Report Date : 22 MAY 1992
Pagination or Media Count : 5
Abstract : Sensitivities of the positive resists polymethylmethacrylate (PMMA) and diazonapthoquinone sulfonate-novolac (Shipley System 9) have been determined at an exposure wavelength of 140 A. Using thin transmissive support membranes of silicon and polycrystalline diamond, absorbance spectra have been measured over the wavelength range of 80 - 360 A for several resist film thicknesses. The resulting linear absorption coefficients, a, are found to agree with values calculated from published mass absorption coefficients only up to -250 A. At longer wavelengths, the experimentally measured a values are larger than the calculated values for both resists. Combining the exposure sensitivity and absorbance results, the volumetric dose densities at 140 A for PMMA and System 9 are 4600 j/cm3 and 350 j/cm3, respectively.
Descriptors : *LITHOGRAPHY, ABSORPTION, ABSORPTION COEFFICIENTS, COEFFICIENTS, DIAMONDS, FILMS, MASS, MEMBRANES, POLYCRYSTALLINE, SENSITIVITY, SILICON, SPECTRA, SULFONATES, VALUE.
Subject Categories : Photography
Distribution Statement : APPROVED FOR PUBLIC RELEASE