Accession Number : ADP007254

Title :   Effects of Absorption on Resist Performance in Soft-X-Ray Projection Lithography,

Corporate Author : AT AND T BELL LABS HOLMDEL NJ

Personal Author(s) : Mansfield, W. M. ; Bjorkholm, J. E. ; MacDowell, A. A. ; Freeman, R. R. ; Szeto, L. H.

Report Date : 22 MAY 1992

Pagination or Media Count : 3

Abstract : We measure the lithographic parameters of the positive photoresist, PMMA (poly methyl methacrylate) at exposure wavelengths of 37.5 and 14 nm and use them in a modified version of SAMPLE (simulation and modeling of profiles in lithography and etching) to simulate resist profiles at these wavelengths. We conclude that the most important parameter in determining image quality is the exposure independent soft-x-ray absorption coefficient.

Descriptors :   *LITHOGRAPHY, ABSORPTION, IMAGES, PARAMETERS, PROFILES, QUALITY, SOFT X RAYS, X RAYS.

Subject Categories : Photography

Distribution Statement : APPROVED FOR PUBLIC RELEASE