Accession Number : ADP007661

Title :   Propagation of 100-GHz Bandwidth Electrical Pulses on a Silicon-Based Microstrip Line with Buried CoSi sub 2 Groundplane,

Corporate Author : AT AND T BELL LABS HOLMDEL NJ

Personal Author(s) : Roskos, Hartmut ; Nuss, Martin C. ; Goossen, Keith W. ; Kisker, David W. ; Tell, Ben

Report Date : 22 MAY 1992

Pagination or Media Count : 6

Abstract : We present a microstrip line that uses a highly conducting cobalt silicide layer buried 7 micron below the surface of single-crystalline silicon as groundplane. This novel transmission line shows significantly reduced dispersion for electrical pulses of 100 GHz bandwidth compared to a conventional microstrip line with the groundplane on the back of the substrate. The 2.5 ps risetime (10%-90%) of electrical pulses propagating on the line increases to only 3.7 ps after a distance of 5 mm compared to an increase from 2.7 ps to 11.3 ps on a conventional microstrip line.

Descriptors :   *TRANSMISSION LINES, *OPTICAL CIRCUITS, *ELECTROOPTICS, BANDWIDTH, COBALT, DISPERSIONS, LAYERS, PULSES, SILICIDES, SILICON, SUBSTRATES, SURFACES, INTEGRATED CIRCUITS, ALUMINUM, PHOTOCONDUCTIVITY, SYMPOSIA, COBALT ALLOYS.

Subject Categories : Electrical and Electronic Equipment
      Electrooptical and Optoelectronic Devices

Distribution Statement : APPROVED FOR PUBLIC RELEASE