Accession Number : ADP007984

Title :   Fabrication of Arrays of High Quality Quantum Filaments by Deep UV Holography and MBE Growth on Channelled Substrates,

Corporate Author : ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (SWITZERLAND)

Personal Author(s) : Marti, U. ; Proctor, M. ; Monnard, R. ; Martin, D. ; Morier-Genoud, F.

Report Date : JUL 1992

Pagination or Media Count : 4

Abstract : Deep UV (A=257nm) holographic lithography is greatly improved by the application of an antireflective coating and a negative (chemical amplification) resist. Deep 90nm period gratings and smallest feature sizes of 40nm are transfered by dry etching to the substrate. Molecular beam epitaxial growth on finely channeled substrates allows us to fabricate high density arrays of buried GaAlAs quantum wires (filaments) (QF) with an optical quality comparable to flat quantum wells. Orientation of the grating lines along the 011 direction is shown to be the most suited for QF with very small lateral dimensions.

Descriptors :   *EPITAXIAL GROWTH, *LITHOGRAPHY, *ANTIREFLECTION COATINGS, *HOLOGRAPHY, AMPLIFICATION, ARRAYS, CHEMICALS, DENSITY, ETCHING, FILAMENTS, HIGH DENSITY, MOLECULAR BEAMS, QUALITY, SUBSTRATES, SWITZERLAND.

Subject Categories : Solid State Physics
      Mfg & Industrial Eng & Control of Product Sys
      Holography

Distribution Statement : APPROVED FOR PUBLIC RELEASE