Accession Number : ADP007985
Title : Mesoscopic Size Fabrication Technology,
Corporate Author : TOKYO UNIV (JAPAN)
Personal Author(s) : Arakawa, Yasuhiko
Report Date : JUL 1992
Pagination or Media Count : 4
Abstract : Mesoscopic and/or quantum microstructures have recently received great attentions, since new physical phenomena with possible applications to optical devices are expected in these structures'. For this purpose, fabrication technologies including fractional layer superlattice growth, the laser assisted atomic layer epitaxy, and the facet wire growth are intensively investigated. In particular, use of both metal-organic chemical vapor deposition (MOCVD) selective growth technique and electron beam (EB) lithography technique would play important roles. In this paper, we discuss fabrication technologies for quantum wires and quantum boxes with emphasis on these electron-beam assisted MOCVD technologies. In addition, physics of the mesoscopic structures for laser applications is also discussed.
Descriptors : *FABRICATION, *QUANTUM ELECTRONICS, *SOLID STATE PHYSICS, ADDITION, BOXES, CHEMICALS, ELECTRON BEAMS, LASER APPLICATIONS, LASERS, LAYERS, LITHOGRAPHY, METALS, ORGANIC COMPOUNDS, STRUCTURES, SUPERLATTICES, VAPOR DEPOSITION, WIRE, JAPAN, ORGANOMETALLIC COMPOUNDS.
Subject Categories : Solid State Physics
Mfg & Industrial Eng & Control of Product Sys
Distribution Statement : APPROVED FOR PUBLIC RELEASE