Accession Number : ADP008019

Title :   Relationship Between Soft X-Ray Reflectance and Structural Parameters of Nanometer-Period Multilayers for X-Ray Mirrors,

Corporate Author : LABORATOIRES D'ELECTRONIQUE PHILIPS LIMEIL-BREVANNES (FRANCE)

Personal Author(s) : Houdy, Philippe ; Boher, Pierre

Report Date : 05 MAR 1992

Pagination or Media Count : 3

Abstract : Multilayers alternating materials at atomic scale have been deposited, using UIIV diode rf sputtering, to be used as soft X-ray mirrors. We have investigated the relationship between the stack performances (reflectivity, selectivity) and the structural characteristics of the stacks. The use of graphite instead of amorphous carbon in Ni/C multilayers results in an increase of the performances as well as cooling the sample during the deposition. A similar effect is observed in W/BN multilayers introducing nitrogen during the growth to saturate the nitride. In the case of Si/SiN stacks, narrow Bragg peaks and a higher reflectivity are obtained annealing the samples up to 800 deg C. At least, a comparison is made between Mo/Si and Co/Si multilayers in order to show the importance of interface compound formation.

Descriptors :   *MIRRORS, *SOFT X RAYS, X RAYS, REFLECTIVITY, SPUTTERING, X RAY DIFFRACTION, AUGER ELECTRON SPECTROSCOPY, FRANCE.

Subject Categories : Nuclear Physics & Elementary Particle Physics
      Optics

Distribution Statement : APPROVED FOR PUBLIC RELEASE