Accession Number : ADP008021
Title : Stress, Morphology, and Optical Properties of Mo/Si X-Ray Multilayers,
Corporate Author : AT AND T BELL LABS MURRAY HILL NJ
Personal Author(s) : Windt, D.L. ; Kola, R.R. ; Waskiewicz, W.K. ; Hull, R. ; Griffith, J.
Report Date : 05 MAR 1992
Pagination or Media Count : 4
Abstract : Due to its high X-ray reflectance (approx. 60%) for wavelengths longer than the Si-L absorption edge near 125 angstroms, the Mo/Si X-ray multilayer (XML) system is now used in a diverse range of advanced applications, including soft X-ray projection lithography and X-ray astronomy. Consequently, the stability and the structural and optical properties of this system have been extensively studied. High resolution transmission electron microscopy (HRTEM) of sputter-deposited Mo/Si XMLs reveals that the Mo layers are polycrystalline, the Si layers amorphous, and the interface region composed of an amorphous mixture of Mo and Si. Further investigations have indicated that this interlayer material is, in fact, amorphous MoSi2. Thermal anneal studies have revealed the absence of solid-state amorphization, in spite of the presence of the amorphous alloy interfacial layers. Instead, the amorphous interlayers crystallize, and growth of the crystalline product, MoSi2 proceeds in the temperature range 275-550 deg C.
Descriptors : *LITHOGRAPHY, *SOFT X RAYS, ALLOYS, HIGH RESOLUTION, INTERFACES, LAYERS, MATERIALS, MICROSCOPY, MIXTURES, OPTICAL PROPERTIES, POLYCRYSTALLINE, REFLECTANCE, SILICON, STABILITY, X RAY ASTRONOMY, X RAYS, RADIATION ABSORPTION.
Subject Categories : Optics
Nuclear Physics & Elementary Particle Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE