Accession Number : ADP008030
Title : Ray and TEM Analysis of Small Period W-Si and W-B4C Multilayers,
Corporate Author : MICHIGAN UNIV ANN ARBOR
Personal Author(s) : Wood, James ; Parker, Kevin ; Scholhamer, James ; Mansfield, John
Report Date : 05 MAR 1992
Pagination or Media Count : 3
Abstract : In recent reports of the manufacture and characterization of small period multilayers, researchers have utilized high resolution EM and an analysis of Cu-K alpha X-Ray data to interpret and explain variations of reflectivity from theoretical predictions. These theoretical analyses are based on a dynamical reflectivity calculation which incorporates the Debye-Waller factor to simulate layer/interface roughness. Using the same analysis techniques we have evaluated how layer roughness varies with d-spacing and film thickness for small period (15A<d<22A) multilayers.
Descriptors : *REFLECTIVITY, *ROUGHNESS, HIGH RESOLUTION, INTERFACES, LAYERS, PREDICTIONS, RESOLUTION, THICKNESS, VARIATIONS, X RAYS, TUNGSTEN ALLOYS, SILICON ALLOYS, X RAY APPARATUS.
Subject Categories : Optics
Nuclear Physics & Elementary Particle Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE