Accession Number : ADP008035
Title : Pulse Laser Deposition of Layered Synthetic Microstructures,
Corporate Author : AKADEMIYA NAUK SSSR MOSCOW
Personal Author(s) : Gaponov, S.V. ; Kluenkov, E.B. ; Platonov, Yu. Ya. ; Salashchenko, N.N.
Report Date : 05 MAR 1992
Pagination or Media Count : 4
Abstract : The deposition technique of LSM's efficiently reflecting in the soft x-ray region (SXR) should satisfy the following requirements: to be capable of depositing continuous superthin layers up to 5 angstroms thick, to control thickness and crystal structure of superthin layers, to sustain the period thickness at the LSM depth with an accuracy to hundredth fractions of the period. Thus, the admissible rms height of interfacial LSM roughness should not exceed 2-5 angstroms, while the accuracy of sustaining the period thickness in the shortwave part of the SXR region (where the structure period d=15-25 angstroms and the number of efficiently reflecting periods 100) amounts to fractions of Angstrom. The are two methods for depositing superthin layers of definite thickness and multilayer structures synthesized from these layers, i.e. direct measurement of the layer thickness during the deposition procedure or stabilization of the target material sputtering and of the film deposition conditions. These two approaches are realized employing the electron-beam evaporation (EBE) and magnetron sputtering (MS)3.
Descriptors : *DEPOSITION, *SOFT X RAYS, *X RAY APPARATUS, CRYSTAL STRUCTURE, CRYSTALS, ELECTRON BEAMS, EVAPORATION, FILMS, HEIGHT, LAYERS, MAGNETRONS, ROUGHNESS, SPUTTERING, STABILIZATION, STRUCTURES, TARGETS, THICKNESS, USSR.
Subject Categories : Optics
Nuclear Physics & Elementary Particle Physics
Mfg & Industrial Eng & Control of Product Sys
Distribution Statement : APPROVED FOR PUBLIC RELEASE