Accession Number : ADP008036

Title :   Ion-Assisted Sputter Deposition of Mo-Si Multilayers,

Corporate Author : LAWRENCE LIVERMORE NATIONAL LAB CA

Personal Author(s) : Vernon, S.P. ; Stearns, D.G. ; Rosen, R.S.

Report Date : 05 MAR 1992

Pagination or Media Count : 2

Abstract : Mo-Si multilayer (ML) structure fabricated using DC magnetron sputtering in an Ar plasma show a transition from layer to columnar growth as the deposition pressure is increased above approx. 1 mTorr. The dominant effect of the increased deposition pressure is the increased thermalization of Ar neutrals, reflected in charge exchange collisions with the sputtering target, striking the substrate surface. At high deposition pressure there is less energy deposited at the substrate surface which, in turn, modifies the adatom mobility. These effects markedly impact the layer morphology. The layers are observed to have significantly increased roughness at higher deposition pressures. Consequently, the x-ray optical properties of the ML coatings are strongly effected. The measured normal incidence reflectivity at 130 angstroms decreases from approx. 60% to 14% as the deposition pressure is raised from 2.5 to 10 mTorr.

Descriptors :   *DEPOSITION, *OPTICAL PROPERTIES, ADATOMS, COATINGS, LAYERS, MAGNETRONS, MOBILITY, MORPHOLOGY, PRESSURE, REFLECTIVITY, ROUGHNESS, SILICON, SPUTTERING, STRUCTURES, SUBSTRATES, SURFACES, TRANSITIONS, X RAYS, ARGON, X RAY APPARATUS.

Subject Categories : Nuclear Physics & Elementary Particle Physics
      Optics

Distribution Statement : APPROVED FOR PUBLIC RELEASE