Accession Number : ADP008059
Title : Comparison of Microstructure and Thermal Stability of Short Period X-Ray Multilayers,
Corporate Author : CALIFORNIA UNIV BERKELEY LAWRENCE BERKELEY LAB
Personal Author(s) : Nguyen, Tai D. ; Gronsky, Ronald ; Kortright, Jeffrey B.
Report Date : 05 MAR 1992
Pagination or Media Count : 3
Abstract : Detail studies of x-ray multilayer microstructures and stability are essential to a complete understanding of these nano-scali metastable materials, and may lead to synthesis of multilayers of improved performance. The microstructures and phases inside the layers depend upon the period, and show different behaviors for different materials systems. Their response to thermal treatment likewise depends on the materials combinations and the period. In this project, the microstructures and their thermal stability of various period W/C, WC/C, Ru/C and Ru/B4C Multilayers are investigated by High-Resolution Transmission Electron Microscopy (HRTEM) and x-ray diffraction. Multilayers were prepared by magnetron sputtering at floating temperature. The periods of the multilayers range from 2 to 12 nm. Low angle x-ray reflectance measurements of the first several multilayer Bragg peaks were used to determine the periodicity of the multilayers. Microstructural characterization of the multilayers were performed by crosssectional and plan-view TEM. Thermal treatment of the multilayers were performed in a tube furnace under a vacuum of 10 to the minus 6th power torr.
Descriptors : *LAYERS, *THERMAL STABILITY, *X RAYS, *MICROSTRUCTURE, ANGLES, DIFFRACTION, ELECTRON MICROSCOPY, ELECTRONS, FURNACES, HIGH RESOLUTION, LOW ANGLES, MAGNETRONS, MATERIALS, MEASUREMENT, MICROSCOPY, PERIODIC VARIATIONS, PHASE, REFLECTANCE, RESOLUTION, RESPONSE, SPUTTERING, STABILITY, SYNTHESIS, TEMPERATURE, TUBES, VACUUM, X RAY DIFFRACTION, METASTABLE STATE, TUNGSTEN, CARBON, RUTHENIUM, BORON, CARBIDES, OPTICS.
Subject Categories : Nuclear Physics & Elementary Particle Physics
Metallurgy and Metallography
Distribution Statement : APPROVED FOR PUBLIC RELEASE