Accession Number : ADP008067

Title :   Characterization of Etched Laminar Multilayer Amplitude Gratings in the Soft X-Ray Region,

Corporate Author : PARIS-11 UNIV ORSAY (FRANCE) LAB POUR L'UTILISATION DU RAYONNEMENT ELECTROMAG NETIQUE

Personal Author(s) : Troussel, P. ; Schirmann, D. ; Bac, S. ; Barchewitz, R. ; Boher, P.

Report Date : 05 MAR 1992

Pagination or Media Count : 4

Abstract : The fabrication of lamellar multilayer gratings has permitted a number of results on the performances of these devices. The results obtained on a 3 micrometer pitch grating patterned electron beam lithography, testbed at 97 eV photon energy are presented. These are compared to a Kinematical lamellar multilayer grating.

Descriptors :   *ETCHING, *AMPLITUDE, *GRATINGS(SPECTRA), *SOFT X RAYS, ELECTRON BEAMS, ELECTRONS, ENERGY, FABRICATION, LITHOGRAPHY, NUMBERS, PHOTONS, LAMINAR FLOW, SILICON, WAFERS, SPUTTERING.

Subject Categories : Nuclear Physics & Elementary Particle Physics
      Crystallography
      Atomic and Molecular Physics and Spectroscopy

Distribution Statement : APPROVED FOR PUBLIC RELEASE