Accession Number : ADP008070
Title : Imaging X-Ray Multilayer Structures with Cross-Sectional HREM,
Corporate Author : ARIZONA STATE UNIV TEMPE DEPT OF PHYSICS
Personal Author(s) : Cheng, Y. ; Stearns, M.B. ; Smith, D.J. ; Stearns, D.G.
Report Date : 05 MAR 1992
Pagination or Media Count : 2
Abstract : High-resolution electron microscopy (HREM), with a resolution below 2A, is the best tool for observing the actual detailed structure for ML. This gives direct atomic scale information about the film structure, including the bilayer thickness, the crystalline structure and the roughness of the individual layers and the interlayers. In order to maximize the contrast, the HREM images of multilayers are typically recorded with the objective lens close to the Scherzer defocus. For the JEM-4000EX microscope used in this study, the Scherzer defocus is -320A below the in focus position. The question has been raised as to how trustworthy are the multilayer micrographs and in particular how sensitive are the observed multilayer parameters to different defocus conditions of the objective lens. Further questions concern the effects due to the orientation of the cross-sectional specimen. The specimen is usually aligned with a double-tilt sample holder to the edge-on orientation so that the specimen is viewed with the electron beam direction parallel to the layers as well as to one of the zone axes of
Descriptors : *ELECTRON MICROSCOPY, *IMAGES, *LAYERS, *STRUCTURES, *HIGH RESOLUTION, ALIGNMENT, AXES, CONTRAST, CRYSTALS, DIFFRACTION, EDGES, LENSES, SILICON, ELECTRON BEAMS, ELECTRON DIFFRACTION, CROSS SECTIONS, ELECTRONS, FILMS, HOLDERS, MICROSCOPES, ATOMIC PROPERTIES, MICROSCOPY, PARAMETERS, PATTERNS, QUALITY, REGIONS, RESOLUTION, MOLYBDENUM, ROUGHNESS, SCALE, SILICON, SINGLE CRYSTALS, SUBSTRATES, THICKNESS, TILT, TOOLS, X RAYS.
Subject Categories : Nuclear Physics & Elementary Particle Physics
Electrooptical and Optoelectronic Devices
Distribution Statement : APPROVED FOR PUBLIC RELEASE