Accession Number : ADP008087

Title :   Analysis of Electrooptic Device Electrodes: Influence of Metalization Thickness, Substrate Optical Axis Inclination and Buffer Layer,

Corporate Author : MINNESOTA UNIV MINNEAPOLIS DEPT OF ELECTRICAL ENGINEERING

Personal Author(s) : Pregla, R. ; Davidouite, Marat ; WU, Zhiqiang ; Gopinath, Anand

Report Date : APR 1992

Pagination or Media Count : 4

Abstract : Characterization of the transmission line properties of electrooptic modulators has received considerable attention in recent years. Various analytical and numerical approaches have been applied to solve the boundary value problems involving strip lines on anisotropic substrates. In many cases the effects of the electrode thickness and the general nature of the substrate anisotropy were not considered. Consider the shielded strip line structure shown. The electrodes of thickness t are assumed to reside on a substrate characterized by an arbitrary permittivity tensor. The presented analysis also allows the inclusion of a buffer layer between the anisotropic substrate and the electrodes.

Descriptors :   *ELECTROOPTICS, *LIGHT MODULATORS, ANISOTROPY, BOUNDARY VALUE PROBLEMS, BUFFERS, ELECTRODES, INCLUSIONS, LAYERS, STRIP TRANSMISSION LINES, STRUCTURES, SUBSTRATES, TENSORS, THICKNESS.

Subject Categories : Electrooptical and Optoelectronic Devices

Distribution Statement : APPROVED FOR PUBLIC RELEASE